Investigation of Annealing Effect on Characteristics of Nickel-Boron Alloy Thin Films

Authors

  • Dr. T. Baskar Professor, Department of Physics, Shree Sathyam College of Engineering and Technology, Sankari Taluk, Salem District, Tamil Nadu, India
  • Dr. A. Shaji George Independent Researcher, Chennai, Tamil Nadu, India

DOI:

https://doi.org/10.5281/zenodo.10325953

Keywords:

Electroplating, electrolytic bath, crystalline size, VSM, Ni-B, X-ray diffraction, VHN, SEM

Abstract

Ni-B alloy thin films were fabricated through room temperature electroplating, followed by annealing at 200°C. The electroplated Ni-B thin films exhibited a preferred orientation with a facecentered cubic (FCC) phase. Comprehensive analyses were conducted to assess the morphological, structural, and mechanical characteristics of the Ni-B films. These films displayed a bright and uniform coating on the surface, with nano-scale deposits and an average crystalline size of approximately 95 nm. Following annealing, the microhardness of the Ni-B films reached 221 Vickers hardness number (VHN).

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Published

2023-12-11

How to Cite

Dr. T. Baskar, & Dr. A. Shaji George. (2023). Investigation of Annealing Effect on Characteristics of Nickel-Boron Alloy Thin Films. Partners Universal Innovative Research Publication, 1(2), 178–182. https://doi.org/10.5281/zenodo.10325953

Issue

Vol. 1 No. 2 (2023): PUIRP

Section

Articles